佛罗里达大学Jason F. Weaver等报道通过常压XPS(AP-XPS)表征技术研究CH4在IrO2(110)薄膜(生长于Ir(100)基底)于1 Torr压力进行CH4氧化反应。
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参考文献
Rachel Martin, Christopher J. Lee, Vikram Mehar, Minkyu Kim, Aravind Asthagiri, and Jason F. Weaver*, Catalytic Oxidation of Methane on IrO2(110) Films Investigated Using Ambient-Pressure X-ray Photoelectron Spectroscopy, ACS Catal. 2022, 12, 2840–2853
DOI: 10.1021/acscatal.1c06045
https://pubs.acs.org/doi/10.1021/acscatal.1c06045